王超楠,黄保进,鲁听,罗笙芸,任达森,江志明,杨林.ZnO 薄膜包装材料溅射制备工艺与阻隔性能研究[J].包装工程,2018,39(15):100-105.
WANG Chao-nan,HUANG Bao-jin,LU Ting,LUO Sheng-yun,REN Da-sen,JIANG Zhi-ming,YANG Lin.Preparation Technology of ZnO Film and Its Barrier Performance via RF Magnetron Co-sputtering[J].Packaging Engineering,2018,39(15):100-105. |
| ZnO 薄膜包装材料溅射制备工艺与阻隔性能研究 |
| Preparation Technology of ZnO Film and Its Barrier Performance via RF Magnetron Co-sputtering |
| 投稿时间：2018-04-02 修订日期：2018-08-10 |
| DOI：10.19554/j.cnki.1001-3563.2018.15.015 |
| 中文关键词: 射频磁控溅射 氧化锌薄膜 透氧率 透水率 |
| 英文关键词: RF magnetron sputtering ZnO Film OTR WVTR |
| 基金项目:贵州省教育厅青年科技人才成长项目（黔教合 KY 字[2016]162）；贵州民族大学人才引进项目（16yjrcxm019） |
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| 中文摘要: |
| 目的 为了解决普通聚合物包装塑料对水、氧的阻隔能力不足，以及包装内容物货架时间短等问题，研究氧化锌（ZnO）沉积复合薄膜制备工艺与阻隔性能之间的关系，探索其应用于包装材料的可行性。方法 采用射频磁控溅射技术（RF），以 ZnO 为靶材，在 PET 塑料表面沉积制备氧化锌薄膜包装材料，并详细分析射频溅射功率、沉积时间与工作气压对 ZnO 复合薄膜微观形貌、沉积速率以及阻隔性能的影响。结果 当溅射功率为 150 W，沉积时间为 30 min，工作气压为 0.8 Pa 时，ZnO 薄膜均匀且致密，阻隔能力最强，其氧气透过率（OTR）降低为 1.23 mL/(m2•d)，水蒸汽透过率（WVTR）降低为 0.382 g/(m2•d)。与相同厚度下的 PET 原膜相比，所制备的 ZnO 高阻隔薄膜的透氧率降低了 49.5 倍，透湿率降低了 17.6 倍。结论 射频溅射参数通过影响复合薄膜的微观形貌、致密程度、沉积速率以及沉积层厚度等方面对其阻隔能力会产生较大影响。 |
| 英文摘要: |
| The work aims to study the relationship between the preparation technology and the barrier property of zinc oxide (ZnO) deposited compound films and explore the feasibility of the films applied in the packaging materials, regarding the problems that the ordinary polymer packaging plastics have poor barrier property for water and oxygen and the shelf life of packaged objects is short, etc. ZnO films were prepared via RF magnetron sputtering on PET plastic surface with ZnO as the target material. The influence of RF sputtering power, deposition time and work pressure on the morphology, deposition rate and barrier properties of ZnO compound films was analyzed in detail. When the sputtering power was 150 W, the deposition time was 30 min and the work pressure was 0.8 Pa, the ZnO films were uniform and dense, with the strongest barrier property. The OTR of the film was 1.23 mL/(m2·d), and the WVTR was 0.382 g/(m2·d), which were respectively 49.5 and 17.6 times lower than the original PET film with the same thickness. The sputtering parameters will have a larger influence on the barrier property of the compound films by affecting their morphology, density, deposition rate and deposit thickness, etc. |
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